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Strain engineering of graphene on rigid substrates
Yang Zhang1, Yanhan Jin1, Jinglan Liu1
1Center for X-Mechanics and Institute of Applied Mechanics, Zhejiang University Hangzhou 310027 P. R. China peizhao@zju.edu.cn.
Nanoscale Advances
|December 12, 2022
Summary
Researchers developed a new method to apply significant tensile strain to graphene on rigid substrates. This technique enhances graphene
Area of Science:
- Materials Science
- Condensed Matter Physics
- Nanotechnology
Background:
- Graphene's unique electronic properties make it suitable for advanced applications.
- Strain engineering is crucial for tuning graphene's properties.
- Existing methods for straining graphene often rely on flexible or hollow substrates.
Purpose of the Study:
- To propose a novel method for achieving large tensile strain in graphene on rigid substrates.
- To demonstrate the feasibility and effectiveness of the proposed technique.
- To advance the field of graphene-based straintronics.
Main Methods:
- Utilizing PDMS (polydimethylsiloxane) stretching on a rigid substrate.
- Employing interface adjustments and a formvar resin protective layer.
- Analyzing strained graphene using Raman spectroscopy and other characterization techniques.
Main Results:
- Achieved a maximum tensile strain of approximately 1.5% in graphene on a SiO2/Si substrate.
- Demonstrated high cleanness, flatness, and integrity of the strained graphene.
- Confirmed reliable electrical performance of the engineered graphene.
Conclusions:
- The novel method successfully engineers strain in graphene on rigid substrates.
- The technique relies on PDMS stretching, protective layers, and interfacial forces.
- This approach offers potential for future strain-related studies and applications of 2D materials.
