Defect Healing in Graphene via Rapid Thermal Annealing with Polymeric "Nanobandage"

Overcoming throughput challenges in current graphene defect healing processes, such as conventional thermal annealing, is crucial for realizing post-silicon device fabrication. Herein, a new time- and energy-efficient method for defect healing in graphene is reported, utilizing polymer-assisted rapid thermal annealing (RTA). In this method, a nitrogen-rich, polymeric "nanobandage" is coated directly onto graphene and processed via RTA at 800 °C for 15 s. During this process, the polymer matrix is cleanly degraded, while nitrogen released from the nanobandage can diffuse into graphene, forming nitrogen-doped healed graphene. To study the influence of pre-existing defects on graphene healing, lattice defects are purposefully introduced via electron beam irradiation and investigated by Raman microscopy. X-ray photoelectron spectroscopy reveals successful healing of graphene, observing a maximum doping level of 3 atomic nitrogen % in nanobandage-treated samples from a baseline of 0-1 atomic % in non-nanobandage treated samples. Electrical transport measurements further indicate that the nanobandage treatment recovers the conductivity of scanning electron microscope-treated defective graphene at ≈85%. The reported polymer-assisted RTA defect healing method shows promise for healing other 2D materials with other dopants by simply changing the chemistry of the polymeric nanobandage.