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Atomic Layer Deposition of Vanadium Dioxide and a Temperature-dependent Optical Model
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First-Principles Molecular Dynamics Simulations on Water-Solid Interface Behavior of H2O-Based Atomic Layer

Rui Xu1, Zhongchao Zhou1, Yingying Wang1

  • 1Key Laboratory of Carbon Materials of Zhejiang Province, College of Chemistry and Materials Engineering, Wenzhou University, Wenzhou 325035, China.

Nanomaterials (Basel, Switzerland)
|December 23, 2022
PubMed

Keywords:
H2O-based atomic layer deposition (H2O-based ALD)density functional theory (DFT)first-principles molecular dynamics (FPMD)water–solid interface reactionzirconium dioxide (ZrO2)

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