Determining optical material parameters with motion in structured illumination

A set of power measurements as a function of controlled nanopositioner movement of a planar film arrangement in a standing wave field is presented as a means to obtain the thicknesses and the dielectric constants to a precision dictated by noise in an exciting laser beam and the positioning and detector process, all of which can be refined with averaging. From a mutual information perspective, knowing the set of positions at which measurements are performed adds information. While applicable to any arrangement of planar films, the implementation considered involves thin transmissive membranes, as are employed in applications such as optomechanics. We show that measured power data as a function of object position provides sensitivity to the film refractive index and far-subwavelength thickness. Use of a cost function allows iterative retrieval of the film parameters, and a multi-resolution framework is described as a computationally efficient procedure. The approach is complementary to ellipsometry and could play an important role in routine film characterization studies for fields involving solid state material processing, as is common in the semiconductor device field.