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Silicon Nanowire-Assisted High Uniform Arrayed Waveguide Grating.

Shuo Yuan1, Jijun Feng1, Zhiheng Yu1

  • 1Shanghai Key Laboratory of Modern Optical System, Engineering Research Center of Optical Instrument and System, Ministry of Education, School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology, Shanghai 200093, China.

Nanomaterials (Basel, Switzerland)
|January 8, 2023
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Summary
This summary is machine-generated.

Improving arrayed waveguide grating (AWG) uniformity for dense wavelength division multiplexing (DWDM) systems is crucial. A novel silicon nanowire-assisted AWG design significantly enhances uniformity and maintains low insertion loss.

Keywords:
arrayed waveguide gratingnanowiresilicon photonicsuniformity

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Area of Science:

  • Photonics and Optical Engineering
  • Integrated Optics
  • Telecommunications

Background:

  • Arrayed waveguide gratings (AWGs) are key components in dense wavelength division multiplexing (DWDM) systems.
  • Non-uniformity in AWGs degrades system performance and limits channel count.
  • Improving AWG uniformity is essential for advanced DWDM applications.

Purpose of the Study:

  • To propose and investigate a novel silicon nanowire-assisted AWG structure.
  • To enhance the uniformity of AWGs while maintaining low insertion loss.
  • To analyze the impact of nanowire configuration on AWG performance.

Main Methods:

  • A silicon nanowire-assisted AWG structure was designed and simulated.
  • The influence of nanowire number and shape on uniformity and insertion loss was systematically compared.
  • Optimized double nanowire dimensions (230 nm width, 3.5 μm length) were determined for a slot configuration.

Main Results:

  • The double nanowire configuration demonstrated superior performance in improving uniformity and reducing insertion loss.
  • Non-uniformity was reduced from 1.09 dB and 1.6 dB to 0.24 dB and 0.63 dB for 8- and 16-channel AWGs, respectively.
  • The proposed design maintains the original device footprint and offers simple fabrication.

Conclusions:

  • The silicon nanowire-assisted AWG design effectively improves non-uniformity and insertion loss.
  • This approach provides a practical solution for high-uniformity AWGs in DWDM systems.
  • The design is compatible with existing fabrication processes and suitable for highly integrated DWDM systems.