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Graphene oxide microstructure control of electrosprayed thin films.

Anton Karlsson1, Helena Grennberg2, Stefan Johansson1

  • 1Microsystems Technology, Department of Materials Science and Engineering, Uppsala University Uppsala Sweden anton.karlsson@angstrom.uu.se.

RSC Advances
|January 23, 2023
PubMed
Summary

Controlling graphene oxide (GO) thin film microstructure is key for tailored applications. Electrospray deposition (ESD) distance impacts GO flake structure, with 2-4 mm offering optimal results by minimizing defects.

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Area of Science:

  • Materials Science
  • Nanotechnology
  • Surface Science

Background:

  • Graphene oxide (GO) thin film microstructure influences electrical and optical properties.
  • Controlling GO microstructure is essential for tailoring material applications.

Purpose of the Study:

  • To compare GO microstructures from electrospray deposition (ESD) with random deposition.
  • To investigate the effect of ESD parameters on GO thin film microstructure.
  • To identify optimal ESD conditions for desired GO microstructures.

Main Methods:

  • Electrospray deposition (ESD) of GO thin films.
  • MATLAB simulations and dip coating for comparison.
  • Scanning electron microscopy (SEM) for microstructure analysis.
  • Development of a semi-automatic image analysis script for unbiased evaluation.

Main Results:

  • ESD GO thin film microstructure is tunable by adjusting nozzle-to-substrate distance.
  • Low nozzle distance leads to flat GO flakes but can cause drying patterns.
  • High nozzle distance results in GO flake folding, crumpling, and agglomeration.
  • An optimal nozzle-to-substrate distance of 2-4 mm was identified for minimal defects.

Conclusions:

  • ESD offers a controllable method for fabricating GO thin films with specific microstructures.
  • The nozzle-to-substrate distance is a critical parameter in ESD for managing GO flake morphology.
  • The 2-4 mm distance range provides a balance, reducing drying effects and GO agglomeration for improved thin films.