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Updated: Aug 12, 2025

U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen
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U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen

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Cr2+ solid solution in UO2 evidenced by advanced spectroscopy

Hannah Smith1, Luke T Townsend1, Ritesh Mohun1

  • 1NucleUS Immobilisation Science Laboratory, Department of Materials Science and Engineering, The University of Sheffield, Sheffield, UK.

Communications Chemistry
|January 25, 2023
PubMed

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