Universal Narrowband Wavefront Shaping with High Quality Factor Meta-Reflect-Arrays

Lin Lin1,2, Jack Hu3, Sahil Dagli3

  • 1Department of Electrical and Systems Engineering, Washington University in St. Louis, St. Louis, Missouri 63130, United States.

Nano Letters
|February 6, 2023
PubMed
Summary

Researchers developed novel silicon metasurfaces with high-quality factor meta-atoms. These metasurfaces enable efficient light manipulation with minimal structural changes, offering enhanced sensitivity and nonlinear wave shaping capabilities.

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