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Related Experiment Video

Updated: Aug 10, 2025

Atomically Traceable Nanostructure Fabrication
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Damage-free LED lithography for atomically thin 2D material devices.

Yue Shi1, Takaaki Taniguchi2, Ki-Nam Byun3

  • 1Department of Materials Chemistry and Institute of Materials and Systems for Sustainability (IMaSS), Nagoya University, Nagoya, 464-8601, Japan. shi.yue@imass.nagoya-u.ac.jp.

Scientific Reports
|February 14, 2023
PubMed
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We developed a damage-free, on-demand manufacturing method for 2D materials using light-emitting diode (LED) lithography. This cost-effective technique enables precise electrode patterning on sensitive 2D materials like MoS2 and graphene oxides.

Area of Science:

  • Materials Science
  • Nanotechnology
  • Device Engineering

Background:

  • Precise electrode patterning is crucial for advancing 2D material-based electronic devices.
  • Conventional lithography techniques can damage sensitive 2D materials, limiting their application.
  • There is a need for mild, cost-effective, and maskless patterning methods.

Purpose of the Study:

  • To introduce a novel, damage-free photolithography method for 2D materials using light-emitting diode (LED) lithography.
  • To demonstrate the versatility and effectiveness of LED lithography for fabricating 2D material devices.
  • To provide a cost-effective and accessible alternative to conventional lithography.

Main Methods:

  • Utilized a combination of an optical microscope and a commercial LED projector for photolithography.

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  • Employed low-energy red light for optical characterization and alignment.
  • Used high-energy blue light for photoresist exposure and development of custom electrode patterns.
  • Applied the method to various 2D materials including MoS2, graphene oxides, and RuO2.

    • Main Results:

    • Achieved damage-free photolithography on selected 2D materials.
    • Successfully fabricated patterned electrodes with feature sizes as small as 1-2 μm.
    • Demonstrated maskless patterning capabilities.
    • Verified the suitability for sensitive 2D materials.

    Conclusions:

    • LED lithography offers a mild, maskless, and damage-free approach for patterning 2D materials.
    • This method is particularly advantageous for fabricating devices from sensitive nanomaterials.
    • The technique is cost-effective, requiring no expensive instruments, high vacuum, or complex operations.
    • LED lithography presents a viable and accessible tool for 2D material device manufacturing.