Jove
Visualize
Contact Us
JoVE
x logofacebook logolinkedin logoyoutube logo
ABOUT JoVE
OverviewLeadershipBlogJoVE Help Center
AUTHORS
Publishing ProcessEditorial BoardScope & PoliciesPeer ReviewFAQSubmit
LIBRARIANS
TestimonialsSubscriptionsAccessResourcesLibrary Advisory BoardFAQ
RESEARCH
JoVE JournalMethods CollectionsJoVE Encyclopedia of ExperimentsArchive
EDUCATION
JoVE CoreJoVE BusinessJoVE Science EducationJoVE Lab ManualFaculty Resource CenterFaculty Site
Terms & Conditions of Use
Privacy Policy
Policies

Related Concept Videos

You might also read

Related Articles

Articles linked to this work by shared authors, journal, and citation graph.

Sort by
Same author

Efficacy and safety of hepatectomy in hepatitis B-related hepatocellular carcinoma with compensated versus recompensated cirrhosis: A propensity score matching study.

Surgery·2026
Same author

Integrated single-cell and bulk transcriptomic analyses reveal a stem-like epithelial subpopulation in adenocarcinoma of the esophagogastric junction and identify VASN as a novel regulator of tumor stemness.

Frontiers in immunology·2026
Same author

Efficient and Precise Force Field Optimization for Biomolecules Using DPA-3.

Journal of chemical information and modeling·2026
Same author

Terminal-Flip Monte Carlo: Accelerating the Convergence of Molecular Dynamics and Alchemical Free Energy Calculations.

Journal of chemical theory and computation·2026
Same author

Steady-state quantum coherence in driven open quantum system: An optimal transformation analysis.

The Journal of chemical physics·2026
Same author

Study on the preparation of multifunctional bacterial cellulose-based wound dressings and their in vitro hemostatic performance.

Scientific reports·2026

Related Experiment Video

Updated: Aug 9, 2025

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
10:25

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope

Published on: September 14, 2018

10.2K

Phase defect characterization using generative adversarial networks for extreme ultraviolet lithography.

Hang Zheng, Sikun Li, Wei Cheng

    Applied Optics
    |February 23, 2023
    PubMed
    Summary

    Artificial neural networks accurately reconstruct multilayer defect profiles in extreme ultraviolet (EUV) mask blanks. This advancement is crucial for precise mask defect compensation and repair in EUV lithography.

    More Related Videos

    Patterning via Optical Saturable Transitions - Fabrication and Characterization
    08:19

    Patterning via Optical Saturable Transitions - Fabrication and Characterization

    Published on: December 11, 2014

    6.9K
    Multi-step Variable Height Photolithography for Valved Multilayer Microfluidic Devices
    10:18

    Multi-step Variable Height Photolithography for Valved Multilayer Microfluidic Devices

    Published on: January 27, 2017

    14.5K

    Related Experiment Videos

    Last Updated: Aug 9, 2025

    Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
    10:25

    Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope

    Published on: September 14, 2018

    10.2K
    Patterning via Optical Saturable Transitions - Fabrication and Characterization
    08:19

    Patterning via Optical Saturable Transitions - Fabrication and Characterization

    Published on: December 11, 2014

    6.9K
    Multi-step Variable Height Photolithography for Valved Multilayer Microfluidic Devices
    10:18

    Multi-step Variable Height Photolithography for Valved Multilayer Microfluidic Devices

    Published on: January 27, 2017

    14.5K

    Area of Science:

    • Semiconductor Manufacturing
    • Nanotechnology
    • Optical Engineering

    Background:

    • Multilayer defects in extreme ultraviolet (EUV) mask blanks can significantly distort reflectivity and phase.
    • Accurate characterization of these defect profiles is essential for effective mask defect compensation and repair strategies.

    Purpose of the Study:

    • To develop an artificial neural network (ANN) framework for reconstructing the profile parameters of multilayer defects in EUV mask blanks.
    • To enable high-accuracy multilayer defect characterization using aerial images.

    Main Methods:

    • Utilized aerial images of defective EUV mask blanks captured at various illumination angles.
    • Employed a series of generative adversarial networks (GANs) within the ANN framework.
    • Developed a novel method for multilayer defect profile reconstruction.

    Main Results:

    • Achieved high accuracy in reconstructing the profile parameters of multilayer defects.
    • Demonstrated the effectiveness of the ANN framework in characterizing EUV mask blank defects.
    • Provided a robust method for obtaining critical defect profile information.

    Conclusions:

    • The proposed ANN framework offers a highly accurate solution for characterizing multilayer defects in EUV mask blanks.
    • This method facilitates precise defect compensation and repair, improving EUV lithography processes.
    • The use of GANs with aerial imagery provides a powerful tool for defect analysis.