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Updated: Aug 9, 2025

Fabrication of Nano-engineered Transparent Conducting Oxides by Pulsed Laser Deposition
Published on: February 27, 2013
Sub-ps Pulsed Laser Deposition of Boron Films for Neutron Detector Applications
Maria Luisa De Giorgi1,2, Muhammad Rizwan Aziz1, Alexandra Manousaki3
1Dipartimento di Matematica e Fisica "E. De Giorgi", Università del Salento, 73100 Lecce, Italy.
Abstract:
In view of the demand for high-quality thermal neutron detectors, boron films have recently attracted widespread research interest because of their special properties. In this work, we report on the deposition of boron films on silicon substrates by sub-picosecond pulsed laser deposition (PLD) at room temperature. Particular emphasis was placed on the investigation of the effect of the laser energy density (fluence) on the ablation process of the target material, as well as on the morphological properties of the resulting films. In addition, based on the study of the ablation and deposition rates as a function of the fluence, the ablation/deposition mechanisms are discussed. We show that well-adherent and stable boron films, with good quality surfaces revealing a good surface flatness and absence of cracks, can be obtained by means of the PLD technique, which proves to be a reliable and reproducible method for the fabrication of thick boron coatings that are suitable for neutron detection technology.
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