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Development of controlled nanosphere lithography technology.

Artem A Osipov1,2, Alina E Gagaeva3, Anastasiya B Speshilova1

  • 1Peter the Great St. Petersburg Polytechnic University, St. Petersburg, 195251, Russian Federation.

Scientific Reports
|February 27, 2023
PubMed
Summary

This study optimizes nanosphere lithography (NSL) for creating nanostructures. Key parameters for spin-coating and plasma etching were identified to achieve high-coverage nanosphere masks and controllable nanoneedle fabrication.

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Area of Science:

  • Materials Science
  • Nanotechnology
  • Surface Science

Background:

  • Nanosphere lithography (NSL) is a cost-effective technique for fabricating nanostructures.
  • Spin-coating is a promising method for creating nanosphere masks, but requires optimization.
  • Controlling nanosphere size is crucial for various nanoelectronic and optoelectronic applications.

Purpose of the Study:

  • To investigate the influence of spin-coating parameters on nanosphere mask formation.
  • To study the controllable size reduction of nanospheres using plasma etching.
  • To optimize NSL for high-coverage and reproducible fabrication of nanostructures.

Main Methods:

  • Spin-coating of 300 nm nanospheres on a substrate.
  • Inductively coupled plasma etching for nanosphere size reduction.
  • Analysis of technological parameters affecting coverage and etching rates.

Main Results:

  • Optimized spin-coating parameters (speed, time, solution composition) increased substrate coverage to 97.8%.
  • Plasma etching parameters (high-frequency power) precisely controlled nanosphere diameter reduction.
  • Process reproducibility reached 98.6%, enabling nanoneedle fabrication.

Conclusions:

  • Optimized NSL parameters enable efficient and reproducible fabrication of nanosphere masks.
  • Plasma etching provides accurate control over nanosphere size reduction for nanoneedle applications.
  • The developed NSL process is suitable for nanoelectronics, optoelectronics, and field emission cathodes.