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Updated: Aug 8, 2025

In Situ Transmission Electron Microscopy with Biasing and Fabrication of Asymmetric Crossbars Based on Mixed-Phased a-VOx
Published on: May 13, 2020
Effect of Y-doping on switching mechanisms and impedance spectroscopy of HfO-based RRAM devices
Jiao Bai1, Weiwei Xie1, Dehao Qu1
1Key Laboratory of Intelligent Control and Optimization for Industrial Equipment (Dalian University of Technology), Ministry of Education; School of Control Science and Engineering, Faculty of Electronic Information and Electrical Engineering, Dalian University of Technology, Dalian 116024, People's Republic of China.
Abstract:
Y-doping can effectively improve the performance of HfO-based resistive random-access memory (RRAM) devices, but the underlying physical mechanism of Y-doping affecting the performance of HfO-based memristors is still missing and unclear. Although impedance spectroscopy (IS) has been widely used to investigate impedance characteristics and switching mechanisms of RRAM devices, there is less IS analysis on Y-doped HfO-based RRAM devices as well as devices at different temperatures. Here, the effect of Y-doping on the switching mechanism of HfO-based RRAM devices with a Ti/HfO/Pt structure were reported using current-voltage characteristics and IS. The results indicated that doping Y into HfOfilms could decrease the forming/operate voltage and improve the RS uniform. Both doped and undoped HfO-based RRAM devices obeyed the oxygen vacancies (VO) conductive filament model along the grain boundary (GB). Additionally, the GB resistive activation energy of the Y-doped device was inferior to that of the undoped device. It exhibited a shift of theVOtrap level towards the conduction band bottom after Y-doping in the HfOfilm, which was the main reason for the improved RS performance.
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