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Membrane Fabrication and Modification by Atomic Layer Deposition: Processes and Applications in Water Treatment and
Amir Hossein Behroozi1, Vahid Vatanpour2,3,4, Louise Meunier1
1Department of Chemical Engineering, Queen's University, Kingston K7L 3N6, Ontario, Canada.
ACS Applied Materials & Interfaces
|March 10, 2023
Summary
Atomic layer deposition (ALD) enhances membranes for water and gas purification. This technique improves membrane performance, enabling treatment of emerging contaminants and advancing separation technologies.
Area of Science:
- Materials Science
- Chemical Engineering
- Environmental Science
Background:
- Membrane-based separations are crucial for global water and gas purification.
- Existing membranes require novel modifications for enhanced industrial applications.
Purpose of the Study:
- To review the application of Atomic Layer Deposition (ALD) in membrane fabrication and modification.
- To explore how ALD coatings improve membrane performance for water and gas treatment.
Main Methods:
- ALD technique for depositing uniform, angstrom-scale coating layers.
- Review of inorganic and organic barrier films used with ALD.
- Categorization of ALD applications based on treated medium (water/gas).
Main Results:
- ALD coatings, primarily metal oxides, enhance antifouling, selectivity, permeability, and hydrophilicity.
- ALD broadens membrane applications for emerging contaminants in water and air.
- ALD is adaptable to various membrane chemistries and morphologies.
Conclusions:
- ALD is a promising technique for next-generation membrane development.
- ALD offers a pathway to overcome limitations in current membrane separation performance.
- Further research into ALD advancements, limitations, and challenges is needed for comprehensive guidelines.
Keywords:
atomic layer depositiongas separationmembrane processessurface modificationwater purification
