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Improving Etched Flatness by Micro Airflow Array Pressurization in ITO Glass Laser Machining.

Rong Chen1, Zhaojie Chen2, Jin Xie2

  • 1College of Mechanical and Electrical Engineering, Guangdong University of Science and Technology, Dongguan 510645, China.

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|March 29, 2023
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Summary

Micro-airflow array pressurization improves laser etching of indium tin oxide (ITO) glass by controlling workpiece warpage. This method enhances precision and prevents circuit defects in industrial production.

Keywords:
ITO glassair bearingflatnesslaser etchingmicro-airflow

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Area of Science:

  • Materials Science
  • Manufacturing Engineering
  • Optoelectronics

Background:

  • Laser etching of indium tin oxide (ITO) glass is susceptible to workpiece warpage during positioning, leading to circuit defects.
  • Traditional methods struggle to maintain the flatness required for micron-scale etching circuits.

Purpose of the Study:

  • To introduce and evaluate a micro-airflow array pressurization technique for high-precision laser etching of ITO glass.
  • To mitigate warpage-induced issues in ITO glass laser etching through controlled micro-deformation.

Main Methods:

  • Modeling micro-airflow and pressurized micro-deformation concerning airflow pressure and etching gap.
  • Investigating surface flatness variations based on airflow parameters and bearing location.
  • Utilizing a data-twin to determine critical pressurization parameters for industrial application.

Main Results:

  • Uniform airflow pressure distribution and central micro-deformation were achieved using positive airflow pressure.
  • Surface flatness was improved by airflow pressure and etching gap, with optimal ranges identified.
  • The technique reduced flatness to 22 μm within a critical pressurization parameter range (10.7-12.6 Pa).

Conclusions:

  • Micro-airflow array pressurization effectively compensates for initial workpiece flatness during ITO glass laser etching.
  • This method resolves issues of local breaks and deformed circuits common in conventional etching processes.
  • Optimized micro flow pressure enables precise laser etching of fine circuits in industrial ITO glass production.