Structural and Optical Properties of Tungsten Disulfide Nanoscale Films Grown by Sulfurization from W and WO₃

Tungsten disulfide (WS₂) was prepared from W metal and WO₃ by ion beam sputtering and sulfurization in a different number of layers, including monolayer, bilayer, six-layer, and nine-layer. To obtain better crystallinity, the nine-layer of WS₂ was also prepared from W metal and sulfurized in a furnace at different temperatures (800, 850, 900, and 950 °C). X-ray diffraction revealed that WS₂ has a 2-H crystal structure and the crystallinity improved with increasing sulfurization temperature, while the crystallinity of WS₂ sulfurized from WO₃ (WS₂-WO₃) is better than that sulfurized from W-metal (WS₂-W). Raman spectra show that the full-width at half maximum (FWHM) of WS₂-WO₃ is narrower than that of WS₂-W. We demonstrate that high-quality monocrystalline WS₂ thin films can be prepared at wafer scale by sulfurization of WO₃. The photoluminescence of the WS₂ monolayer is strongly enhanced and centered at 1.98 eV. The transmittance of the WS₂ monolayer exceeds 80%, and the measured band gap is 1.9 eV, as shown by ultraviolet-visible-infrared spectroscopy.