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Updated: Aug 2, 2025

A Standard and Reliable Method to Fabricate Two-Dimensional Nanoelectronics
Published on: August 28, 2018
Novel design constructed In2S3@SnO2 hollow heterojunctions by insufficiently etched MOFs as framework for
Hongyang Tan1, Delun Zheng2, Min Chen3
1Department of Chemistry and Laboratory for Preparation and Application of Ordered Structural Materials of Guangdong Province, Shantou University, Shantou, Guangdong 515063, PR China.
Abstract:
Compared to sufficiently etched MOFs materials, insufficiently etched MOFs materials tend to display unsatisfactory performance due to their immature structure and have been eliminated from scientific research. Herein, this work reported a novel In2S3@SnO2 heterojunction (In2S3@SnO2-HSHT) materials, which were stably synthesized in high temperature aqueous environment and equipped extraordinary photoelectrochemical (PEC) properties, fabricated by a succinct hydrothermal synthesis method using insufficiently etched MIL-68 as a self-sacrificing template. Compared with the control groups and In2S3@SnO2 heterojunctions with collapse morphology synthesized by sufficiently etched MIL-68 in high temperature aqueous environment, In2S3@SnO2-HSHT synthesized from insufficiently etched MIL-68 as a template had a massively enhanced light-harvesting capability and generated more photoinduced charge carriers due to its well-preserved hollow structure. Therefore, based on outstanding PEC performance of In2S3@SnO2-HSHT, the established PEC label-free signal-off immunosensor to detect CYFRA 21-1, revealing vivid selectivity, stability, and reproducibility. This novel strategy adopted the insufficient chemical etching method neglected by the mainstream chemical etching approaches, which solved the challenge that the stability of the sufficient etched MOFs with hollow structure cannot be maintained under the subsequent high temperature aqueous reaction conditions, and was further applied to the design of hollow heterojunction materials for photoelectrochemical fields.
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