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Applied Optics
|May 3, 2023
Summary
This study introduces a new method for material characterization using spectral photometric and ellipsometric data. It offers a reliable approach for determining thicknesses and refractive indices of multilayer samples post-production.
Area of Science:
- Materials Science
- Optical Physics
- Metrology
Background:
- Accurate post-production characterization of multilayer (ML) materials is crucial for quality control and performance prediction.
- Traditional methods may require complex sample preparation or in-situ monitoring, limiting practical application.
- Spectral photometric and ellipsometric techniques offer non-destructive analysis capabilities.
Purpose of the Study:
- To propose and validate a post-production characterization approach for multilayer samples.
- To determine the reliability of different characterization strategies using ex-situ measurements.
- To identify the most practical and effective characterization method for real-world applications.
Main Methods:
- Utilized spectral photometric and ellipsometric data from specially prepared single-layer (SL) and multilayer (ML) sample sets.
- Performed ex-situ measurements on both building-block SL samples and the final ML sample.
- Compared the accuracy and reliability of various ex-situ characterization strategies applied to the final ML sample.
Main Results:
- Successfully determined reliable thicknesses and refractive indices for the final ML samples.
- Demonstrated the effectiveness of the proposed ex-situ characterization approach.
- Evaluated and compared the performance of different characterization strategies.
Conclusions:
- The proposed post-production characterization method provides reliable material property determination.
- Ex-situ analysis of the final ML sample is a viable and practical alternative to extensive sample preparation.
- This approach offers a valuable tool for optimizing material characterization in industrial settings.

