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Maskless lithography for large area patterning of three-dimensional microstructures with application on a light
Optics Express
|May 9, 2023
Summary
A novel maskless lithography system enables 3D ultraviolet patterning of photoresist microstructures over large areas. This technology precisely controls UV dose for creating complex 3D shapes for industrial applications.
Area of Science:
- Microfabrication
- Optical Engineering
- Materials Science
Background:
- Traditional lithography often requires masks, limiting flexibility and increasing costs.
- Achieving precise 3D microstructures over large areas presents significant fabrication challenges.
Purpose of the Study:
- To present a maskless lithography system for fabricating 3D photoresist microstructures.
- To demonstrate a novel UV patterning scheme for controlled dose distribution.
- To enable mass production of microstructures for industrial applications.
Main Methods:
- Utilized a maskless lithography system with a UV light source, digital micromirror device (DMD), and projection lens.
- Implemented an obliquely scanning and step strobe lighting (OS3L) scheme for precise UV dose control.
- Mechanically scanned the projected UV image across the photoresist layer.
Main Results:
- Successfully fabricated 3D photoresist microstructures with truncated conical and nuzzle-shaped profiles.
- Achieved patterning over a large area of 160 × 115 mm².
- Demonstrated the utility of fabricated microstructures for replicating nickel molds and producing light-guiding plates.
Conclusions:
- The developed 3D maskless lithography system offers a flexible and efficient method for fabricating complex microstructures.
- The OS3L technique provides precise control over UV dose, enabling the creation of desired 3D profiles.
- The technology holds significant potential for applications in the back-lighting and display industries.
