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Updated: Jul 31, 2025

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Characterization of SiN Integrated Optical Phased Arrays on a Wafer-Scale Test Station
Published on: April 1, 2020
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Impact of process variations on splitter-tree-based integrated optical phased arrays
Optics Express
|May 9, 2023
Summary
Variations in integrated optical phased arrays significantly impact beam profiles. This study analyzes these effects on different architectures, confirming consistency with experimental data.
Area of Science:
- Integrated photonics
- Optical engineering
Background:
- Integrated optical phased arrays (IOPAs) are crucial for beam steering.
- Fabrication imperfections like spatial variation and line edge roughness can degrade performance.
Purpose of the Study:
- To investigate the impact of intra-wafer variations on IOPAs.
- To analyze the effects of pattern density mismatch and line edge roughness on beam profiles.
- To evaluate these impacts across different IOPA architecture parameters.
Main Methods:
- Modeling the effects of systematic spatial variation.
- Simulating pattern density mismatch and line edge roughness.
- Analyzing performance variations across different architectural designs.
Main Results:
- Intra-wafer variations significantly alter the emitted beam profile in the array dimension.
- Pattern density mismatch and line edge roughness are key contributors to beam degradation.
- The analysis demonstrates consistency with experimental findings.
Conclusions:
- Understanding and mitigating fabrication variations is critical for high-performance IOPAs.
- The study provides insights into optimizing IOPA design and fabrication processes.
- Results validate the analytical models used in the research.

