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Updated: Jul 2, 2026

Convergent Polishing: A Simple, Rapid, Full Aperture Polishing Process of High Quality Optical Flats & Spheres
Published on: December 1, 2014
Chunpu Lv1, Jingwei Huang1, Ming Zhang2
1Department of Automation, Tsinghua University, Beijing 100084, China.
This study introduces a semi-supervised deep kernel active learning (SSDKAL) model to accurately predict material removal rate (MRR) in chemical-mechanical planarization (CMP). The SSDKAL model effectively utilizes unlabeled data, outperforming existing methods with lower error rates.
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