You might also read
Articles linked to this work by shared authors, journal, and citation graph.
Updated: Jul 25, 2025

Emission Spectroscopic Boundary Layer Investigation during Ablative Material Testing in Plasmatron
Published on: June 9, 2016
Xiang Wu1,2,3, Bin Fan1,2,3, Qiang Xin1,2,3
1National Key Laboratory of Optical Field Manipulation Science and Technology, Chinese Academy of Sciences, Chengdu 610209, China.
This study introduces a novel plasma figure correction method for quartz sub-mirrors, combining parallel material removal with ink masking. This technique significantly reduces figure errors in optical elements, offering a faster, scalable solution for manufacturing.
Area of Science:
Background:
Purpose of the Study:
Main Methods:
Main Results:
Conclusions: