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Plasma Figure Correction Method Based on Multiple Distributed Material Removal Functions.

Xiang Wu1,2,3, Bin Fan1,2,3, Qiang Xin1,2,3

  • 1National Key Laboratory of Optical Field Manipulation Science and Technology, Chinese Academy of Sciences, Chengdu 610209, China.

Micromachines
|June 28, 2023
PubMed
Summary
This summary is machine-generated.

This study introduces a novel plasma figure correction method for quartz sub-mirrors, combining parallel material removal with ink masking. This technique significantly reduces figure errors in optical elements, offering a faster, scalable solution for manufacturing.

Keywords:
figure correctionmaterial removal distributionmaterial removal functionsreactive ion etching

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Area of Science:

  • Optics and Materials Science
  • Advanced Manufacturing Processes

Background:

  • Quartz sub-mirrors are critical optical components requiring high precision.
  • Traditional optical element manufacturing faces challenges in achieving nanometer-level accuracy efficiently.

Purpose of the Study:

  • To develop and demonstrate a universal plasma figure correction method for quartz sub-mirrors.
  • To analyze the technological characteristics of this novel approach.

Main Methods:

  • Integration of a plasma parallel removal process with an ink masking layer for precise material ablation.
  • Application of a multi-distributed material removal function for figure correction.
  • Iterative correction process to converge surface figure error.

Main Results:

  • Achieved convergence of figure error from ~114 nm RMS to ~28 nm RMS for a quartz element after seven iterations.
  • Demonstrated that processing time is independent of workpiece aperture, enhancing efficiency.
  • Successfully combined plasma removal and ink masking for the first time in this application.

Conclusions:

  • The developed plasma figure correction method shows significant practical potential for optical element manufacturing.
  • This technique offers a new, efficient stage process for the optical manufacturing chain.
  • The method's independence from workpiece aperture size makes it a scalable solution.