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Growth and Electrostatic/chemical Properties of Metal/LaAlO3/SrTiO3 Heterostructures

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Influence of Al₂O₃ Overlayers on Intermolecular Interactions between Metal Oxide Bound Molecules.

Erica S Knorr¹, Cody T Basquill¹, Isabella A Bertini¹

¹Department of Chemistry and Biochemistry, Florida State University, Tallahassee, FL 32306-4390, USA.

Molecules (Basel, Switzerland)

|June 28, 2023

Summary

Controlling intermolecular interactions on inorganic substrates is key for hybrid electronics. This study shows surface loading increases excimer formation, while atomic layer deposition (ALD) of Al2O3 overlayers can decrease it.

Keywords:

ALD dye sensitized excimer metal oxide transient absorption

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Facile Preparation of Ultrafine Aluminum Hydroxide Particles with or without Mesoporous MCM-41 in Ambient Environments

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Published on: May 11, 2017

Area of Science:

Materials Science
Surface Chemistry
Photophysics

Background:

Intermolecular interactions on inorganic substrates significantly influence material properties for hybrid electronics.
Controlling these surface interactions is crucial for device performance.

Purpose of the Study:

To investigate the effect of surface loading and Al2O3 overlayers on intermolecular interactions of a ZrO2-bound anthracene derivative.
To probe these interactions using photophysical properties.

Main Methods:

Studied a ZrO2-bound anthracene derivative on inorganic substrates.
Varied surface loading density of the anthracene derivative.
Applied atomic layer deposition (ALD) of Al2O3 overlayers.
Analyzed absorption, emission, and transient absorption spectra.

Main Results:

Surface loading density did not affect absorption spectra.
Increased surface loading led to more excimer features, observed in emission and transient absorption.
ALD of Al2O3 overlayers reduced excimer formation but did not eliminate it.

Conclusions:

Surface loading influences intermolecular interactions and excimer formation.
ALD offers a method to tune these interactions after initial surface loading.
Further research may optimize ALD for precise control over interfacial properties.