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Scalable Solution Phase Synthesis of 2D Siloxene via a Two-Step Interlayer Expansion Process
Seung-Bo Ko1,2, Yan Sun1,2, Gun Park1
1Department of Materials Science and Engineering, KAIST, Daejeon 34141, Republic of Korea.
ACS Applied Materials & Interfaces
|June 28, 2023
Summary
Researchers developed a new method to create high-quality, few-layer siloxene nanosheets. These 2D siloxene materials show promise for advanced electronics and flexible supercapacitors.
Area of Science:
- Materials Science
- Nanotechnology
- Solid State Chemistry
Background:
- Two-dimensional (2D) siloxene is gaining attention due to its compatibility with silicon-based technologies.
- Traditional synthesis methods are limited to multilayered structures.
Purpose of the Study:
- To develop a high-yield method for producing single to few-layer siloxene nanosheets.
- To explore the potential of these 2D siloxene materials in electronic devices.
Main Methods:
- A two-step procedure involving interlayer expansion and liquid phase exfoliation was employed.
- Siloxene nanosheets were characterized for lateral dimension, thickness, and stability in water.
Main Results:
- High-yield production of few-layer siloxene nanosheets (0.8–4.8 nm thickness, up to 4 μm lateral dimension) stabilized in water.
- Demonstrated formation of 2D/2D graphene/siloxene heterostructures with enhanced properties.
- Achieved high device capacitance in supercapacitor devices using these heterostructures.
Conclusions:
- The developed method offers a scalable route to high-quality 2D siloxene.
- Siloxene-based heterostructures show potential for high-performance and flexible supercapacitors.
