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Inductively coupled plasma (ICP) is the common plasma source used in atomic emission spectroscopy (AES), a technique that detects and analyzes various elements in a sample. This method is often called inductively coupled plasma atomic emission spectroscopy (ICP-AES).
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Robust dynamic spectroscopic imaging ellipsometer based on a monolithic polarizing Linnik interferometer.

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    A new dynamic spectroscopic imaging ellipsometer (DSIE) offers enhanced stability for thin film analysis. This robust system utilizes a novel compensation method for accurate 3-D spectroscopic ellipsometric mapping.

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    Area of Science:

    • Optical Metrology
    • Materials Science
    • Spectroscopic Ellipsometry

    Background:

    • Dynamic Spectroscopic Imaging Ellipsometry (DSIE) is crucial for material characterization.
    • Previous DSIE systems suffered from long-term stability issues, limiting large-scale applications.
    • Accurate 3-D spectroscopic ellipsometric mapping requires robust phase error compensation.

    Purpose of the Study:

    • To develop a robust DSIE system with improved long-term stability.
    • To introduce and evaluate a global mapping phase error compensation method.
    • To demonstrate the system's reliability in a general environment with external disturbances.

    Main Methods:

    • Implementation of a monolithic Linnik-type polarizing interferometer.
    • Integration of an additional compensation channel to enhance stability.
    • Application of a global mapping phase error compensation technique.
    • Conducting whole thin film wafer mapping under various environmental disturbances.

    Main Results:

    • The monolithic Linnik-type scheme with a compensation channel significantly improved system stability.
    • The global mapping phase error compensation method proved effective for accurate 3-D mapping.
    • The DSIE system demonstrated robustness and reliability in a disturbed environment.

    Conclusions:

    • The developed robust DSIE system overcomes previous stability limitations.
    • The proposed compensation method enables accurate and reliable large-scale spectroscopic ellipsometric mapping.
    • This advancement is critical for precise thin film analysis in diverse industrial settings.