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Aperture-Controlled Fabrication of All-Dielectric Structural Color Pixels.

Clémentine Lipp1, Audrey Jacquillat1, Daniel Migliozzi1

  • 1École Polytechnique Fédérale de Lausanne EPFL-STI-IMT-LMIS4, Station 17, Lausanne CH-1015, Switzerland.

ACS Applied Materials & Interfaces
|June 29, 2023
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Summary

Researchers developed a new method for creating microscopic structural color pixels using UV photolithography. This technique enables vibrant, compact color displays compatible with commercial manufacturing processes.

Keywords:
interferencemicropatternssingle-mask processstructural colorsthin films

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Area of Science:

  • Optics and Photonics
  • Materials Science
  • Nanotechnology

Background:

  • Conventional color filters are bulky and unsuitable for compact pixelized color images.
  • Interference colors, while known, have lacked scalable manufacturing methods for micro-scale applications.

Purpose of the Study:

  • To develop a simple, scalable method for creating microscopic structural color pixels.
  • To enable the fabrication of compact, vibrant color displays using interference principles.

Main Methods:

  • Utilized a single-mask UV photolithography process on an all-dielectric substrate.
  • Employed aperture-controlled physical deposition of silicon dioxide within a hollow cavity to create a thin-film stack.
  • Engineered the bottom layer thickness of the thin-film stack to control constructive interference of reflected light.

Main Results:

  • Successfully created micrometer-scale pixels that display predefined colors based on controlled thin-film interference.
  • Demonstrated the ability to combine these pixels to produce vibrant, visible color images.
  • Achieved a fully CMOS-compatible, wafer-scale fabrication process.

Conclusions:

  • The developed interference-based method offers a scalable and cost-effective solution for structural color pixel fabrication.
  • This technology overcomes limitations of conventional color filters, enabling compact and vibrant structural color displays.
  • The CMOS-compatible process opens avenues for large-scale commercial applications of structural colors.