Nonlinear confocal positioner for micron-scale target alignment

This paper presents a novel target positioner system that exhibits high sensitivity and accuracy. Specifically, the system is capable of precisely locating rough target surfaces within a micron-scale in the focal plane. The high sensitivity comes from the nonlinear detection scheme which uses the two-photon-absorption process in a Si-photodiode and a CMOS sensor at 1550 [nm]. The setup employs a confocal configuration that is easy to align and does not require a conjugated focal plane selective aperture (pinhole), thus demonstrating its feasibility and tilt tolerance of the target. Moreover, the system offers high accuracy up to 5 [μm], which corresponds to the step size of the focus scanning. The presented positioner system has potential applications in microfabrication with lasers and laser-driven plasma accelerators even at high repetition rates, limited by the detection bandwidth of the photodiode. Additionally, the principle can be extended to cameras if spatial information is needed and the system design can be extended to other spectral ranges with minimal changes.