Electro-optical tunable interleaver in hybrid silicon and lithium niobate thin films

The interleaver was one of the key devices in dense wavelength division multiplexing (DWDM) applications. In this study, an interleaver with an asymmetrical Mach-Zehnder interferometer structure was designed, fabricated, and characterized in hybrid silicon and lithium niobate thin films (Si-LNOI). The interleaver based on Si-LNOI could be fabricated by mature processing technology of Si photonic, and it was capable of the electro-optical (E-O) tuning function by using the E-O effect of LN. In the range of 1530-1620 nm, the interleaver achieved a channel spacing of 55 GHz and an extinction ratio of 12-28 dB. Due to the large refractive index of Si, the Si loading strip waveguide based on Si-LNOI had a compact optical mode area, which allowed a small electrode gap to improve the E-O modulation efficiency of the interleaver. For an E-O interaction length of 1 mm, the E-O modulation efficiency was 26 pm/V. The interleaver will have potential applications in DWDM systems, optical switches, and filters.