Selective Removal of Gold: N-Heterocyclic Carbenes as Positive Etch Resists on Planar Gold Surfaces

Florian Bosse1, Christian Gutheil1, D Thao Nguyen1

  • 1Organisch-Chemisches Institut and Center for Soft Nanoscience Westfälische Wilhelms-Universität Münster Corrensstraße 36, 48149 Münster, Germany.