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Published on: May 13, 2020
Semiempirical Two-Dimensional Model of the Bipolar Resistive Switching Process in Si-NCs/SiO2 Multilayers
Juan Ramirez-Rios1, Karla Esther González-Flores1, José Juan Avilés-Bravo1
1Electronics Department, Instituto Nacional de Astrofísica, Óptica y Electrónica, San Andrés Cholula 72840, Puebla, Mexico.
This study simulates resistive switching in silicon nanocrystal (Si-NC) memristors using a stochastic model. The model explains conductive filament formation and intermediate states observed in experiments, advancing memristor understanding.
Area of Science:
- Materials Science
- Nanotechnology
- Electrical Engineering
Background:
- Bipolar resistive switching memories (RRAM) are crucial for next-generation electronics.
- Silicon nanocrystals (Si-NCs) embedded in oxide matrices offer unique properties for RRAM devices.
- Understanding the formation and rupture of conductive filaments (CFs) is key to memristor reliability.
Purpose of the Study:
- To simulate the SET and RESET processes in Si-NC embedded bipolar resistive switching memories.
- To investigate the role of oxygen vacancies in forming conductive filaments within Si-NC/SiO2 multilayers.
- To compare simulation results with experimental current-voltage data for validation.
Main Methods:
- Development of a stochastic model based on 2D oxygen vacancy configurations.
- Simulation of resistive switching in Si-NC/SiO2 multilayer memristor devices.
- Analysis of devices with 1 and 3 Si-NC/SiO2 bilayers.
Main Results:
- The stochastic model successfully simulates SET and RESET processes.
- Si-NCs act as nucleation sites for oxygen vacancy agglomerates, promoting CF formation.
- An intermediate resistive state in the 3-bilayer device is explained by preferential oxygen vacancy generation along CF paths.
Conclusions:
- The stochastic model provides a robust framework for understanding memristor switching mechanisms.
- Si-NCs play a critical role in facilitating conductive filament formation in RRAM.
- The study elucidates the origin of intermediate resistive states, crucial for memristor design and control.
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