Preparation of Mixed Few-Layer GeSe Nanosheets with High Efficiency by the Thermal Sublimation Method

Two-dimensional (2D) GeSe has been proven promising in fast and broadband optoelectronic applications for its complicated band structure, inert surface property, and excellent stability. The major challenge is the deficiency of the effective technique for controllably prepared large-scale few-to-monolayer GeSe films. For this purpose, a layer-by-layer thinning method by thermal sublimation for manufacturing large-scale mixed few-layer GeSe with direct bandgaps is proposed, and an optimized sublimation temperature of 300 °C in vacuum is evaluated by atomic force microscopy. Scanning electron microscopy, transmission electron microscopy, energy-dispersive spectra, and fluorescence mapping measurements are performed on the thinned GeSe layers, and results are well-indexed to the orthorhombic lattice structure with direct bandgaps with an atomic ratio of Ge/Se ≈ 5:4. Raman and fluorescence spectra show an α-type crystalline structure of the thinned GeSe films, indicating the pure physical process of the sublimation thinning. Both the bulk and few-layer GeSe films demonstrate broadband absorption. Conductivity of the few-layer GeSe device indicates the overall crystalline integrity of the film after thermal thinning. Given the convenience and efficiency, we provide an effective approach for fabrication of large-scale 2D materials that are difficult to be prepared by traditional methods.