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Related Experiment Video

Updated: Jun 17, 2026

Characterization of Surface Modifications by White Light Interferometry: Applications in Ion Sputtering, Laser Ablation, and Tribology Experiments

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Published on: February 27, 2013

High-Resolution Laser Interference Ablation and Amorphization of Silicon.

Andreas Blumenstein¹, Peter Simon¹, Jürgen Ihlemann¹

¹Institut für Nanophotonik Göttingen e.V., Hans-Adolf-Krebs-Weg 1, 37077 Göttingen, Germany.

Nanomaterials (Basel, Switzerland)

|August 12, 2023

Summary

Researchers demonstrate laser interference patterning on silicon surfaces using UV femtosecond pulses, creating 350 nm periodic structures. Different laser fluences and pulse numbers yield varied surface modifications, including amorphization, melt flow, voids, and laser-induced periodic surface structures (LIPSS).

Keywords:

UV femtosecond laser amorphization laser interference patterning laser-induced periodic surface structures silicon

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Area of Science:

Materials Science
Laser Physics
Surface Engineering

Background:

Precise surface structuring is crucial for advanced material applications.
Laser-based methods offer high resolution and control for surface modification.

Purpose of the Study:

To demonstrate laser interference patterning on silicon surfaces using UV femtosecond pulses.
To investigate the effects of laser fluence and pulse number on structure formation.

Main Methods:

Utilized UV femtosecond laser pulses (450 fs, 248 nm) with a mask projection setup.
Investigated single-pulse and multipulse irradiation effects on silicon.
Analyzed resulting surface structures using microscopy and metrology.

Main Results:

Achieved 350 nm periodic structures on silicon surfaces via interference patterning.
Observed fluence-dependent phenomena: amorphization, lateral melt flow, and void formation.
Demonstrated combined patterns of interference structures and laser-induced periodic surface structures (LIPSS) with multipulse irradiation.

Conclusions:

Femtosecond laser interference patterning is an effective method for creating nanoscale periodic structures on silicon.
Control over laser parameters allows for tailoring surface morphology, including LIPSS formation.