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Iridium-Based Selective Emitters for Thermophotovoltaic Applications.
Gnanavel Vaidhyanathan Krishnamurthy1, Manohar Chirumamilla2,3, Tobias Krekeler4
1Institute of Photoelectrochemistry, Helmholtz-Zentrum Hereon, Max-Planck-Strasse 1, 21502, Geesthacht, Germany.
Advanced Materials (Deerfield Beach, Fla.)
|August 16, 2023
Summary
Iridium (Ir) offers superior oxidation resistance for refractory metamaterials compared to tungsten (W), crucial for thermophotovoltaic applications. This study demonstrates Ir
Area of Science:
- Materials Science
- Nanotechnology
- Solid State Physics
Background:
- Refractory-metal-based metamaterials are vital for thermophotovoltaics but prone to oxidation failure.
- Tungsten (W), Molybdenum (Mo), Tantalum (Ta), Niobium (Nb), and Rhenium (Re) commonly used refractory metals degrade via oxidation.
- Gold (Au) has suitable optical properties but lacks thermal stability for high-temperature applications.
Purpose of the Study:
- To investigate the thermal endurance and oxidation resistance of Iridium (Ir) as a potential alternative to refractory metals in metamaterials.
- To evaluate the stability of a HfO2/Ir/HfO2 multilayer system for high-temperature applications.
- To compare the long-term stability of Ir/HfO2 and W/HfO2 metamaterials under annealing conditions.
Main Methods:
- Annealing experiments of HfO2/Ir/HfO2 systems up to 1240°C in vacuum and inert atmospheres.
- In situ X-ray diffraction (XRD) analysis of Ir/HfO2 and W/HfO2 multilayered selective emitters.
- Long-term annealing tests (100 hours) at 1000°C under vacuum (2 × 10^-6 mbar).
Main Results:
- The Ir layer in the HfO2/Ir/HfO2 system showed no oxidation in vacuum and inert gas atmospheres up to 1240°C.
- Ir layer agglomeration was observed above 1100°C due to HfO2 layer degradation.
- In situ XRD confirmed the oxidation stability of Ir/HfO2 multilayers, while W/HfO2 multilayers degraded significantly over 100 hours at 1000°C.
- W-based metamaterials demonstrated poor long-term stability even at 1000°C.
Conclusions:
- Iridium (Ir) exhibits excellent oxidation resistance, making it a promising material for refractory plasmonic metamaterials.
- The HfO2/Ir/HfO2 system demonstrates potential for high-temperature applications, although HfO2 stability needs further optimization.
- Ir-based metamaterials are suitable for selective emitters in thermophotovoltaic systems, offering strong suppression of long-wavelength radiation.
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