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Published on: August 17, 2017
Metal-Induced Trap States: The Roles of Interface and Border Traps in HfO2/InGaAs
Huy-Binh Do1, Quang-Ho Luc2, Phuong V Pham3
1Faculty of Applied Science, Ho Chi Minh City University of Technology and Education, 01 Vo Van Ngan Street, Ho Chi Minh City 700000, Vietnam.
Abstract:
By combining capacitance-voltage measurements, TCAD simulations, and X-ray photoelectron spectroscopy, the impact of the work function of the gate metals Ti, Mo, Pd, and Ni on the defects in bulk HfO2 and at the HfO2/InGaAs interfaces are studied. The oxidation at Ti/HfO2 is found to create the highest density of interface and border traps, while a stable interface at the Mo/HfO2 interface leads to the smallest density of traps in our sample. The extracted values of Dit of 1.27 × 1011 eV-1cm-2 for acceptor-like traps and 3.81 × 1011 eV-1cm-2 for donor-like traps are the lowest reported to date. The density and lifetimes of border traps in HfO2 are examined using the Heiman function and strongly affect the hysteresis of capacitance-voltage curves. The results help systematically guide the choice of gate metal for InGaAs.
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