Carrier Transport
Precipitation Gravimetry
You might also read
Articles linked to this work by shared authors, journal, and citation graph.
Updated: Jul 16, 2025

Probing C84-embedded Si Substrate Using Scanning Probe Microscopy and Molecular Dynamics
Published on: September 28, 2016
Yubo Sun1,2, Zhiping Wang1,2, Mingrun Du2
1School of Materials Science and Engineering, Shenyang University of Technology, Shenyang 110870, China.
Silicon atom diffusion in nickel-based superalloys is influenced by doping elements like chromium, molybdenum, and tungsten. Larger dopant radii increase silicon diffusion barriers, impacting brazed joint structures.
Area of Science:
Background:
Purpose of the Study:
Main Methods:
Main Results:
Conclusions: