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Method to construct the initial structure of optical systems based on full-field aberration correction.

Xianxing Chen, Xu Zhang, Zhiqiang Su

    Applied Optics
    |September 14, 2023
    PubMed
    Summary

    This study introduces a new method for designing reflective optical systems, focusing on correcting aberrations across the entire field of view. The approach ensures high-quality imaging for advanced optical applications like extreme ultraviolet lithography.

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    Area of Science:

    • Optical Engineering
    • Lithography Technology
    • Aberration Theory

    Background:

    • Achieving high image quality in optical systems requires precise aberration control.
    • Existing methods may not adequately address full-field aberration correction for demanding applications.
    • Reflective optical systems are crucial for technologies like extreme ultraviolet (EUV) lithography.

    Purpose of the Study:

    • To propose an initial structure construction method for reflective optical systems.
    • To achieve full-field aberration correction for extremely low aberration optical systems.
    • To enhance the imaging quality of optical systems used in advanced lithography.

    Main Methods:

    • Utilizing full-field aberration as the primary evaluation criterion.
    • Establishing a multi-field evaluation function based on characteristic field points.
    • Employing spatial ray tracing for structural constraints.
    • Applying a combinatorial non-dominated sorting and metaheuristics algorithm for multi-objective optimization.

    Main Results:

    • An initial reflective optical system structure with corrected third-order aberrations over the full field was obtained.
    • An extreme ultraviolet lithography objective was successfully designed.
    • The optimized objective achieved a numerical aperture of 0.33 and a root-mean-square wavefront error of 0.128 nm.

    Conclusions:

    • The proposed method effectively corrects full-field aberrations in reflective optical systems.
    • This approach yields initial optical system structures suitable for high-performance imaging.
    • The developed technique is applicable to the design of advanced lithography objectives.