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In Situ Transmission Electron Microscopy with Biasing and Fabrication of Asymmetric Crossbars Based on Mixed-Phased a-VOx
Published on: May 13, 2020
Markus Hellenbrand1, Judith MacManus-Driscoll2
1Department of Materials Science & Metallurgy, University of Cambridge, 27 Charles Babbage Rd, Cambridge, CB3 0FS, UK. mkhh2@cam.ac.uk.
This review focuses on multi-level resistive switching in hafnium oxide devices for neuromorphic computing. While device-level progress is early, full network implementations show promise for future in-memory computing applications.
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