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Spectral and Angle-Resolved Magneto-Optical Characterization of Photonic Nanostructures
Published on: November 21, 2019
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Snapshot Mueller spectropolarimeter imager
Tianxiang Dai1, Thaibao Phan1, Evan W Wang1
1Department of Electrical Engineering, Stanford University, Stanford, CA 94305 USA.
Microsystems & Nanoengineering
|October 10, 2023
Summary
This study presents a novel imaging system for simultaneous Mueller polarization and wavelength measurements. This technology enables precise thin film thickness mapping for advanced optical metrology applications.
Area of Science:
- Optics and Photonics
- Materials Science
- Computational Imaging
Background:
- Accurate polarization and wavelength measurements are crucial for material characterization and optical metrology.
- Existing imaging systems often require multiple captures or complex setups, limiting real-time analysis.
- Simultaneous acquisition of polarization and spectral information presents a significant challenge in optical imaging.
Purpose of the Study:
- To develop an advanced imaging system capable of simultaneously capturing complete Mueller polarization responses across multiple wavelength channels in a single image acquisition.
- To demonstrate a real-time calibration method for this novel imaging system using a customized neural network.
- To validate the system's performance by accurately reconstructing a thin film thickness map.
Main Methods:
- Implementation of a division-of-focal-plane concept integrating multiplexed Fourier optics and a telescopic light-field imaging system.
- Utilization of broadband nanostructured plasmonic polarizers as functional pinhole apertures for polarization-resolved imaging.
- Development and application of a neural network-based calibration approach for real-time data processing.
Main Results:
- Successful simultaneous recording of complete Mueller polarization responses and wavelength channels in a single image capture.
- Highly interpretable polarization and wavelength information directly recorded on the image sensor.
- Accurate reconstruction of a thin film thickness map from a four-inch wafer using the calibrated system.
Conclusions:
- The developed imaging system offers a significant advancement in simultaneous polarization and spectral imaging.
- The real-time calibration method enhances the system's practical applicability in metrology and machine vision.
- This technology holds potential for diverse applications in metrology, machine vision, computational imaging, and optical computing.
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