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Methods of Formation of Protective Inhibited Polymer Films on Tungsten.

Natalia A Shapagina1, Alexey V Shapagin1, Vladimir V Dushik1

  • 1Frumkin Institute of Physical Chemistry and Electrochemistry, Russian Academy of Sciences, Leninsky Prospect 31-4, 119071 Moscow, Russia.

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Summary

Cataphoretic deposition (CPD) created superior anticorrosive polymer films on tungsten compared to prolonged exposure. This method optimizes protective film formation for enhanced tungsten surface protection.

Keywords:
cataphoretic deposition (CPD)corrosion inhibitorsinhibited formulations (INFOR)inhibited polymer filmsorganosilanestungsten

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Area of Science:

  • Materials Science
  • Corrosion Science
  • Surface Chemistry

Background:

  • Tungsten surfaces require effective anticorrosion strategies.
  • Inhibited polymer films offer potential for corrosion protection.
  • Organosilane and corrosion inhibitors are key components in protective formulations.

Purpose of the Study:

  • To compare two methods for forming anticorrosive inhibited polymer films on tungsten: prolonged exposure and cataphoretic deposition (CPD).
  • To characterize the films formed by each method, focusing on molecular organization, subprimary structure, and protective properties.
  • To determine the optimal parameters for CPD to achieve superior film performance.

Main Methods:

  • Film formation via prolonged exposure in inhibited formulations (INFOR) and cataphoretic deposition (CPD).
  • Surface analysis using Attenuated Total Reflectance Fourier-Transform Infrared Spectroscopy (ATR-FTIR) and Transmission Electron Microscopy (TEM).
  • Scanning Electron Microscopy (SEM) for optimizing CPD parameters, and sessile drop/Differential Scanning Calorimetry (DSC) for energy/thermochemical properties.
  • Electrochemical Impedance Spectroscopy (EIS) and corrosion behavior tests to evaluate protective filming ability and adhesive behavior.

Main Results:

  • CPD enabled the formation of protective inhibited polymer films with optimized parameters (duration, current density) identified by SEM.
  • Films formed by CPD exhibited superior energy, thermochemical, operational, and protective characteristics compared to those from prolonged exposure.
  • Molecular organization (ATR-FTIR) and subprimary structure (TEM) were analyzed for both methods, revealing differences in film morphology and arrangement.

Conclusions:

  • Cataphoretic deposition (CPD) is a more effective method for forming high-performance anticorrosive inhibited polymer films on tungsten than prolonged exposure.
  • The study established optimal CPD conditions for creating durable and protective surface films on tungsten.
  • The findings provide valuable insights for developing advanced surface protection strategies for tungsten components.