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    Area of Science:

    • Optics
    • Surface Metrology
    • Nanotechnology

    Background:

    • Nanometer accuracy stitching interferometry enables high-performance ion beam figuring (IBF) of x-ray mirrors.
    • X-ray diffraction grating fabrication can introduce surface errors, degrading mirror figure quality.
    • Potential for ion beam smoothing to degrade grating structure and diffraction efficiency is a concern.

    Purpose of the Study:

    • Investigate post-production correction of x-ray diffraction gratings using IBF.
    • Evaluate the impact of IBF on grating structure and diffraction efficiency.
    • Assess the feasibility of achieving nanometer-level surface planarity while preserving grating integrity.

    Main Methods:

    • Utilized nanometer accuracy stitching interferometry for in-process feedback during IBF.
    • Applied ion beam figuring to correct figure errors on x-ray diffraction gratings.
    • Measured changes in grating structure and diffraction efficiency before and after IBF.

    Main Results:

    • Achieved nanometer-level planarity of the global grating surface using IBF.
    • Successfully preserved the grating structure during the ion beam correction process.
    • No detectable change in diffraction efficiency was observed after IBF.

    Conclusions:

    • IBF is a viable technique for correcting figure errors in x-ray diffraction gratings.
    • IBF can achieve high surface precision without compromising grating performance.
    • This method is critical for advancing ultra-high spectral resolution and maintaining brightness in coherent x-ray beams.