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Updated: Jul 12, 2025
Fabrication of 1-D Photonic Crystal Cavity on a Nanofiber Using Femtosecond Laser-induced Ablation
Published on: February 25, 2017
Methods for extending working distance using modified photonic crystal for near-field lithography.
Wen-Peng Zhang1, Xiao-Tian Li1, Jin-Hong Dai1
1Key Laboratory of Optoelectronic Technology & Systems (Chongqing University), Ministry of Education, and College of Optoelectronic Engineering, Chongqing University, Chongqing 400044, People's Republic of China.
This study introduces a modified photonic crystal for near-field lithography, significantly extending working distances for super-resolution nano-pattern fabrication. This advancement simplifies manufacturing applications by enabling high-resolution patterning with greater ease.
Area of Science:
- Nanotechnology
- Optics
- Materials Science
Background:
- Near-field lithography offers advantages for super-resolution nano-pattern fabrication.
- Evanescent wave decay limits the working distance (WD) in conventional methods.
Purpose of the Study:
- To propose a novel photolithography method using a modified photonic crystal (PC) to overcome WD limitations.
- To enhance the fabrication of super-resolution nano-patterns with improved manufacturing feasibility.
Main Methods:
- Embedding a defect layer into an all-dielectric multilayer photonic crystal structure.
- Utilizing the modified PC to amend the photonic band gap and enhance high-wave vector (high-k) waves.
- Analyzing the capability for deep subwavelength pattern formation and diversified 2D pattern generation.
Main Results:
- Extended air WD for near-field lithography, significantly relaxing engineering challenges.
- Fabrication of 32 nm half-pitch patterns (λ/6) at an air WD of 100 nm.
- Demonstrated production of diversified 2D patterns with a single exposure using linear polarized light.
Conclusions:
- The improved dielectric PC enables near-field lithography with large WD, strong field intensity, and uniformity.
- This method is applicable for producing super-resolution periodic patterns in real-world manufacturing.
- The design significantly enhances the practical application of near-field lithography.
