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Updated: Jul 12, 2025

U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen
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U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen

Published on: February 21, 2019

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Thermodynamic model of the oxidation of Ln-doped UO2

V L Vinograd1, A A Bukaemskiy2, G Deissmann2

  • 1Institute of Energy and Climate Research-Nuclear Waste Management (IEK-6), Forschungszentrum Jülich GmbH, Jülich, Germany. v.vinograd@fz-juelich.de.

Scientific Reports
|October 20, 2023
PubMed

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