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Transferable Force Field for Gallium Nitride Crystal Growth from the Melt Using On-The-Fly Active Learning
Xiangyu Chen1, William Shao1, Nam Q Le2
1Department of Chemical and Biomolecular Engineering, Johns Hopkins University, Baltimore, Maryland 21218, United States.
We developed a machine learning force field for atomic simulations, achieving density functional theory accuracy at classical molecular dynamics speeds. This enables efficient simulation of gallium nitride (GaN) additive manufacturing processes.
Area of Science:
- Materials Science
- Computational Chemistry
- Chemical Engineering
Background:
- Atomic-scale simulations of reactive processes are computationally limited by the lack of accurate semiempirical force fields and the high cost of ab initio methods.
- Simulating complex processes like gallium nitride (GaN) thin film growth via additive manufacturing requires efficient and accurate modeling tools.
Purpose of the Study:
- To develop a nonparameterized, machine learning-based force field for atomic-scale simulations.
- To enable accurate and efficient modeling of the gallium nitride (GaN) crystallization process in additive manufacturing.
Main Methods:
- Utilized an "on-the-fly" active learning technique to create a novel machine learning force field.
- Developed a single force field capable of modeling solid, liquid, and gas phases involved in GaN synthesis.
- Validated computational predictions against experimental measurements and ab initio calculations.
Main Results:
- The machine learning force field achieves accuracy comparable to density functional theory with the speed of classical molecular dynamics.
- Successfully modeled the crystallization of gallium nitride (GaN) from liquid and gaseous precursors.
- Demonstrated the force field's ability to simulate solid-liquid interfaces and GaN crystallization from the melt.
Conclusions:
- The developed transferable, nonparameterized force field significantly enhances the accuracy and efficiency of simulating reactive processes.
- This advancement opens new avenues for precisely modeling liquid-phase epitaxial growth and establishing robust additive manufacturing models for GaN thin films.
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