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A Comprehensive Review on Combinatorial Film via High-Throughput Techniques
Dongxin Wang1,2, Wei Jiang3,4, Shurong Li1
1State Key Laboratory of Special Rare Metal Materials, Northwest Rare Metal Materials Research Institute Ningxia Co., Ltd., Shizuishan 753000, China.
Materials (Basel, Switzerland)
|October 28, 2023
Summary
Gradient thin-film deposition enables high-throughput material discovery for advanced technologies. This review covers synthesis, characterization, and limitations of combinatorial films, accelerating materials innovation.
Area of Science:
- Materials Science
- Nanotechnology
- Chemical Engineering
Background:
- 21st-century technological progress relies on novel materials with optimized, multi-functional properties.
- High-throughput and combinatorial approaches are essential for efficient materials exploration and design.
Purpose of the Study:
- To review recent advancements in gradient thin-film deposition for high-throughput material library preparation.
- To provide a fundamental understanding of gradient thin-film synthesis, characterization, and limitations.
Main Methods:
- Gradient thin films synthesized via magnetron sputtering, multi-arc ion plating, e-beam evaporation, additive manufacturing, and chemical bath deposition.
- Characterization of combinatorial films including microstructure, oxidation, corrosion, and mechanical properties.
- Discussion of screening methods for property evaluation.
Main Results:
- Emphasis on high-throughput synthesis techniques for gradient thin films.
- Presentation of diverse properties of combinatorial films.
- Evaluation of screening methodologies for material properties.
Conclusions:
- Gradient thin-film deposition is a mature technology for rapid materials discovery.
- Understanding limitations in high-throughput preparation and characterization is crucial for future development.
