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Updated: Jul 11, 2025

Fabrication of Schottky Diodes on Zn-polar BeMgZnO/ZnO Heterostructure Grown by Plasma-assisted Molecular Beam Epitaxy
Published on: October 23, 2018
John L Lyons1, Anderson Janotti2
1Center for Computational Materials Science, US Naval Research Laboratory, Washington, DC 20375, United States of America.
Ultrawide-bandgap (UWBG) semiconductors struggle with p-type conductivity due to self-trapped holes. Rutile silicon dioxide (r-SiO2) shows potential for efficient p-type doping, unlike other UWBG oxides.
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