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Exploring the Surface Oxidation and Environmental Instability of 2H-/1T'-MoTe2 Using Field Emission-Based Scanning
Christoph Reuter1, Gernot Ecke2, Steffen Strehle1
1Institute of Micro- and Nanotechnologies, Microsystems Technology Group, Technische Universität Ilmenau, Max-Planck-Ring 12, 98693, Ilmenau, Germany.
Advanced Materials (Deerfield Beach, Fla.)
|November 6, 2023
Summary
This study introduces a novel resistless nanopatterning technique for molybdenum ditelluride (MoTe2) using scanning probe lithography. The method creates nanoscale patterns by inducing oxidation, enabling precise structuring of MoTe2 devices.
Area of Science:
- Materials Science
- Nanotechnology
- Surface Science
Background:
- Molybdenum ditelluride (MoTe2) is a promising 2D material with unique electronic properties.
- Precise nanopatterning is crucial for fabricating advanced Mo2T devices.
Purpose of the Study:
- To develop a resistless nanopatterning method for 2H- and 1T'-MoTe2.
- To demonstrate the fabrication of nanoribbon field-effect transistors using this technique.
Main Methods:
- Utilizing scanning probe lithography with a Fowler-Nordheim tunneling current (30-60 eV) to induce nanoscale oxidation on MoTe2.
- Employing atomic force microscopy (AFM) for pattern generation and characterization.
- Characterizing the tip-grown oxide using Auger electron and Raman spectroscopy.
Main Results:
- Achieved resistless nanopatterning of MoTe2 under ambient conditions.
- Identified the tip-grown oxide as amorphous MoO3/MoOx and TeO2/TeOx.
- Demonstrated anisotropic sensitivity of 1T'-(Td)-MoTe2 to aqueous environments.
- Successfully structured a nanoribbon field-effect transistor from few-layer 2H-MoTe2.
Conclusions:
- The presented scanning probe lithography approach offers a direct and efficient method for MoTe2 nanopatterning.
- This technique enables the fabrication of functional nanodevices and provides insights into MoTe2's environmental sensitivity.

