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Plasma-assisted Molecular Beam Epitaxy of N-polar InAlN-barrier High-electron-mobility Transistors
Published on: November 24, 2016
Kuan-Chang Chang1, Xibei Feng1, Huangbai Liu1
1School of Electronic and Computer Engineering, Peking University Shenzhen Graduate School Shenzhen 518055 China lilei@pkusz.edu.cn.
This study introduces a new computational method to accurately measure the electron mobility in gallium nitride (GaN) High Electron Mobility Transistors (HEMTs). The technique overcomes limitations of traditional methods, offering a more reliable way to determine device performance.
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