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Updated: Jul 11, 2025

A Standard and Reliable Method to Fabricate Two-Dimensional Nanoelectronics
Published on: August 28, 2018
Dielectric Constant in Nanoscale Bubbles on MoS2
Haesol Kim1, Dohyeon Jeon1, Minji Gu1
1Department of Physics, Memory and Catalyst Research Center, Hankuk University of Foreign Studies, Yongin 17035, Republic of Korea.
Abstract:
Nanoscale bubbles form inevitably during the transfer of two-dimensional (2D) materials on a target substrate due to their van der Waals interaction. Despite a large number of studies based on nanobubble structures with localized strain, the dielectric constant (κ) in nanobubbles of MoS2 is poorly understood. Here, we report κ measurements for nanobubbles on MoS2 by probing the polarization forces based on electrostatic force microscopy. Remarkably, higher κ values of 6-8 independent of the nanobubble size are observed for the nanobubbles as compared to flat regions with a κ of ≈3. We find that the charge carrier increase owing to the strain-induced bandgap reduction is responsible for the enhanced κ of the nanobubbles, where the measured κ is in good agreement with the calculations based on the Clausius-Mossotti relation. Our results provide fundamental information about the strain-induced local dielectric properties of 2D materials and a guide for the design and fabrication of high-performance optoelectrical devices based on 2D materials.
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