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Updated: Jul 11, 2025
Preparation of Large-area Vertical 2D Crystal Hetero-structures Through the Sulfurization of Transition Metal Films for Device Fabrication
Published on: November 28, 2017
A mechanism for thickness-controllable single crystalline 2D materials growth
Leining Zhang1, Xiao Kong2, Jichen Dong3
1Beijing Key Laboratory of Construction Tailorable Advanced Functional Materials and Green Applications, MOE Key Laboratory of Cluster Science, School of Chemistry and Chemical Engineering, Beijing Institute of Technology, Beijing 100081, China.
A heterogeneous layer on a substrate is key for synchronic growth of two-dimensional (2D) multilayers. This layer prevents island edge coalescence, enabling wafer-scale synthesis of single-crystal 2D materials with uniform thickness.
Area of Science:
- Materials Science
- Nanotechnology
- Surface Science
Background:
- Recent advances enable wafer-scale synthesis of single-crystal two-dimensional (2D) multilayers via epitaxial island stitching.
- Previously observed multilayer structures (wedding-cake, inverted-wedding-cake) differ from current aligned-edge, same-size/shape multilayer islands.
Purpose of the Study:
- Investigate the growth mechanisms of synchronic 2D multilayers.
- Identify critical factors for maintaining synchronic growth.
- Develop a model explaining synchronic multilayer formation.
Main Methods:
- Experimental investigation of 2D multilayer growth.
- Analysis of the role of a heterogeneous layer on a crystalline substrate.
- Theoretical modeling of interfacial energy and edge passivation effects.
Main Results:
- A heterogeneous layer on a crystalline substrate is essential for synchronic 2D multilayer growth.
- This layer passivates 2D island edges, preventing coalescence.
- High interfacial energy stabilizes the synchronic structure.
Conclusions:
- The proposed model successfully explains synchronic growth of graphene and hexagonal boron nitride multilayers.
- Understanding this mechanism facilitates the synthesis of wafer-scale single-crystal 2D multilayers with uniform thickness.
