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Strain and atomic stacking of bismuth thin film in its quasi-van der Waals epitaxy on (111) Si substrate

Chia-Hsuan Wu1, Chieh Chou1, Hao-Hsiung Lin2,3

  • 1Graduate Institute of Electronics Engineering, National Taiwan University, Taipei, 10617, Taiwan, ROC.

Scientific Reports
|November 13, 2023
PubMed

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